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Laser Ablation Of Silicon Surfaces : The Effects Of A Low Level Background Light, Taposh Kumar Gayen
Laser Ablation Of Silicon Surfaces : The Effects Of A Low Level Background Light, Taposh Kumar Gayen
Theses
The performance of high speed optoelectronic and microelectronic devices largely depends on the uniqueness and development of the fabrication technology. Laser ablation has proven to be an effective three dimensional surface patterning technology. In this thesis, we present findings on the patterning of semiconductor surfaces using laser ablation in air as well as in solutions.
In this thesis, we suggest that the depth of a pattern induced on silicon by firing a pulsed excimer laser in air varies almost linearly with the number of pulses. We report that a He-Ne laser as a background light source has virtually little or …
Aluminum Epitaxy On Silicon, Samuel Cruz Ramac
Aluminum Epitaxy On Silicon, Samuel Cruz Ramac
Theses
The purpose of this work was to study the effect of 4° miscut and chem¬ical pretreatment of Si(111) wafers on the epitaxial growth of Al by thermal evaporation in a UHV environment (~ 10-9 Torr). Two chemical pretreatments of the wafers were used. One included HF only and the other included NH4F after an initial HF treatment. The substrates were not heated dur¬ing deposition. XRD measurements of the films were done before and after annealing in a high vacuum oven for one hour at temperatures between 200 and 350°C.
The A1(200) films deposited on wafers pretreated with …