Engineering Commons^™

Basic Research On The Characteristics Of A Constricted Pulsed Glow Discharge, Sean Daniel Andersen

UNLV Theses, Dissertations, Professional Papers, and Capstones

In certain plasma discharge experiments, it has been observed that under specific conditions a plasma glow discharge column tends to seek the central location of the discharge electrodes away from the electrode edges and chamber walls. Further, the column appears to have the properties of a stabilized equilibrium plasma pinch in a glow (non-arc-like) state. This is unusual since, normally field enhancements occur on edges resulting in arc-like discharge breakdown. Also, the column of plasma that protrudes from the anode emits highly intense, non-uniform light that is uncharacteristically bright for a glow discharge.

The main purpose of this thesis is …

Use Of Ultra High Vacuum Plasma Enhanced Chemical Vapor Deposition For Graphene Fabrication, Shannen Adcock

Graduate Theses and Dissertations

Graphene, what some are terming the "new silicon", has the possibility of revolutionizing technology through nanoscale design processes. Fabrication of graphene for device processing is limited largely by the temperatures used in conventional deposition. High temperatures are detrimental to device design where many different materials may be present. For this reason, graphene synthesis at low temperatures using plasma-enhanced chemical vapor deposition is the subject of much research. In this thesis, a tool for ultra-high vacuum plasma-enhanced chemical vapor deposition (UHV-PECVD) and accompanying subsystems, such as control systems and alarms, are designed and implemented to be used in future graphene growths. …