Engineering Commons^™

Synthetic Aperture Optical Imaging Interferometric Microscopy With Improved Image Quality, Preyom K. Dey

Electrical and Computer Engineering ETDs

The resolution limit of optical microscopy can be extended by using Imaging Interferometric Microscopy (IIM), which uses a low numerical aperture (NA) objective lens to achieve resolution equivalent to that of a high-NA objective lens with multiple sub-images. Along with the resolution enhancement challenge, IIM often suffers from poor image quality. In this dissertation, several image quality improvement methods are proposed and verified with simulation and experimental results. Next, techniques to extend the resolution limit of IIM to ≤ 100nm using a low-NA objective lens are demonstrated. An experimental technique of using a grating coupler on …

Optical Angular Scatterometry: In-Line Approach For Roll-2-Roll And Nano-Imprint Fabrication Systems, Juan Jose Faria-Briceno

Electrical and Computer Engineering ETDs

As critical dimensions continue to shrink and structures become more complex, metrology processes are challenging to implement during in-line nanomanufacturing. Non-destructive, non-contact, and high-speed conditions are required to achieve proper metrology processes during in-line manufacturing. Optical scatterometry is a nanoscale metrology tool widely used in integrated circuit manufacturing for characterization and quality control. However, most applications of optical scatterometry operate off-line. A high-speed, in-line, non-contact, non-destructive scatterometry angular system has been demonstrated in this work to scan pattern surfaces during real-time nano-fabrication.

Our system has demonstrated scanning capabilities using flat, 1D and 2D complex structures. The flat surface samples consist …