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Full-Text Articles in Engineering
Broadband Dielectric Spectroscopic Detection Of Ethanol: A Side-By-Side Comparison Of Zno And Hkust-1 Mofs As Sensing Media, Papa K. Amoah, Zeinab Mohammed Hassan, Pengtao Lin, Engelbert Redel, Helmut Baumgart, Yaw S. Obeng
Broadband Dielectric Spectroscopic Detection Of Ethanol: A Side-By-Side Comparison Of Zno And Hkust-1 Mofs As Sensing Media, Papa K. Amoah, Zeinab Mohammed Hassan, Pengtao Lin, Engelbert Redel, Helmut Baumgart, Yaw S. Obeng
Electrical & Computer Engineering Faculty Publications
The most common gas sensors are based on chemically induced changes in electrical resistivity and necessarily involve making imperfect electrical contacts to the sensing materials, which introduce errors into the measurements. We leverage thermal- and chemical-induced changes in microwave propagation characteristics (i.e., S-parameters) to compare ZnO and surface-anchored metal-organic-framework (HKUST-1 MOF) thin films as sensing materials for detecting ethanol vapor, a typical volatile organic compound (VOC), at low temperatures. We show that the microwave propagation technique can detect ethanol at relatively low temperatures (<100 >°C), and afford new mechanistic insights that are inaccessible with the traditional dc-resistance-based measurements. In addition, …
Solution Atomic Layer Deposition Of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films, Maïssa K.S. Barr, Soheila Nadiri, Dong-Hui Chen, Peter G. Weidler, Sebastian Bochmann, Helmut Baumgart, Julien Bachmann, Engelbert Redel
Solution Atomic Layer Deposition Of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films, Maïssa K.S. Barr, Soheila Nadiri, Dong-Hui Chen, Peter G. Weidler, Sebastian Bochmann, Helmut Baumgart, Julien Bachmann, Engelbert Redel
Electrical & Computer Engineering Faculty Publications
For the first time, a procedure has been established for the growth of surface-anchored metal–organic framework (SURMOF) copper(II) benzene-1,4-dicarboxylate (Cu-BDC) thin films of thickness control with single molecule accuracy. For this, we exploit the novel method solution atomic layer deposition (sALD). The sALD growth rate has been determined at 4.5 Å per cycle. The compact and dense SURMOF films grown at room temperature by sALD possess a vastly superior film thickness uniformity than those deposited by conventional solution-based techniques, such as dipping and spraying while featuring clear crystallinity from 100 nm thickness. The highly controlled layer-by-layer growth mechanism of sALD …