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Materials Science and Engineering
Missouri University of Science and Technology
Microelectromechanical systems<br />Semiconductors -- Etching
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Process Development And Applications Of A Dry Film Photoresist, Phaninder R. Kanikella
Process Development And Applications Of A Dry Film Photoresist, Phaninder R. Kanikella
Masters Theses
"In this study, dry film photoresist was patterned using UV lithography and the sidewall profile was optimized to achieve vertical sidewalls. Sidewall verticality of dry film is very important for better pattern transfer"--Abstract, page iv.