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Environmental Engineering

Clemson University

PFAS

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Influence Of Photoreactor Design Parameters On The Performance Of Ultraviolet Light-Induced Degradation Of Per-And Polyfluoroalkyl Substances By Bismuth Oxy Hydroxy Phosphate And Hexagonal Boron Nitride Photocatalystsinfluence Of Photoreactor Design Parameters On The Performance Of Ultraviolet Light-Induced Degradation Of Per-And Polyfluoroalkyl Substances By Bismuth Oxy Hydroxy Phosphate And Hexagonal Boron Nitride Photocatalysts, Mojtaba Qanbarzadeh Dec 2023

Influence Of Photoreactor Design Parameters On The Performance Of Ultraviolet Light-Induced Degradation Of Per-And Polyfluoroalkyl Substances By Bismuth Oxy Hydroxy Phosphate And Hexagonal Boron Nitride Photocatalystsinfluence Of Photoreactor Design Parameters On The Performance Of Ultraviolet Light-Induced Degradation Of Per-And Polyfluoroalkyl Substances By Bismuth Oxy Hydroxy Phosphate And Hexagonal Boron Nitride Photocatalysts, Mojtaba Qanbarzadeh

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The main objective of this study is to evaluate the practical applicability of heterogeneous photocatalysis technology powered by ultraviolet (UV) photons for the degradation of per and -polyfluoroalkyl substances (PFAS) in contaminated groundwater samples. For this purpose, bismuth oxyhydroxy phosphate (BOHP) and hexagonal boron nitride (hBN) were utilized as the main photocatalysts in slurry photodegradation systems. BOHP (Bi3O(OH)(PO4)2) is a wide bandgap semiconductor with high activity for degrading long-chain perfluorocarboxylic acids (PFCAs) in mild operational conditions. Boron nitride (BN) is another wide bandgap semiconductor material that was used in this study due to its …