Engineering Commons^™

Contactless Electroreflectance, In The Range Of 20 K < T < 300 K, Of Freestanding Wurtzite Gan Prepared By Hydride-Vapor-Phase Epitaxy, Y. S. Huang, Fred H. Pollak, S. S. Park, K. Y. Lee, H. Morkoç

Electrical and Computer Engineering Publications

We have performed a detailed contactless electroreflectance study of the interband excitonic transitions on both the Ga and N faces of a 200-μm-thick freestanding hydride-vapor-phase-epitaxy grown wurtzite GaN sample with low defect concentration in the temperature range between 20 and 300 K. The transition energies of the A, B, and C excitons and broadening parameters of the A and B excitons have been determined by least-square fits to the first derivative of a Lorentzian line shape. The energy positions and separations of the excitonic transitions in the sample reveal the existence of residual strain. At 20 K the broadening parameter …