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Efficacy Of Single And Double Sinx Interlayers On Defect Reduction In Gan Overlayers Grown By Organometallic Vapor-Phase Epitaxy, F. Yun, Y.-T. Moon, Y. Fu, K. Zhu, U. Ozgur, H. Morkoç, C. K. Inoki, T.S. Kuan, Ashutosh Sagar, R. M. Feenstra

Electrical and Computer Engineering Publications

We report on the growth of and evolution of defects in GaN epilayers having single- and double-layer SiNx nanoporous insertion layers. The SiNx was formed in situ in the growth chamber of an organometallic vapor-phase epitaxy system by simultaneous flow of diluted silane and ammonia. The GaN epilayers and SiNx interlayers were grown on 6H-SiC substrates using three different nucleation layers, namely, low-temperature GaN, high-temperature GaN, and high-temperature AlN nucleation layers. X-ray-diffraction rocking curves and cross-sectional and plan-view transmission electron microscope analyses indicated that a nanoporous SiNx layer can reduce the dislocations density in the GaN overgrown layer to ∼3×108cm−2 …