Open Access. Powered by Scholars. Published by Universities.®
Articles 1 - 1 of 1
Full-Text Articles in Engineering
High Power 121.6 Nm Radiation Source For Advanced Lithography, Jianxun Yan
High Power 121.6 Nm Radiation Source For Advanced Lithography, Jianxun Yan
Electrical & Computer Engineering Theses & Dissertations
A novel high power 121.6 nm radiation source based on dielectric barrier discharge (DBD) has been developed for advanced lithography applications. The discharge unit consists basically of a hollow tube made of a dielectric material with two loop-electrodes wrapped on the outside of the tube. The discharge is generated inside the tube by means of a 13.56 MHz RF power system. The discharge unit is located in a vacuum chamber that provides a dynamic gas flow and windows for radiation transmission.
A very intense and spectrally clean Lyman-α line at 121.6 nm was observed by operating the DBD discharge in …