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Characteristics Of Free-Standing Hydride-Vapor-Phase-Epitaxy-Grown Gan With Very Low Defect Concentration, P. Visconti, K. M. Jones, Michael A. Reshchikov, F. Yun, R. Cingolani, Hadis Morkoç, S. S. Park, K. Y. Lee

Electrical and Computer Engineering Publications

A free-standing 300-μm-thick GaN template grown by hydride vapor phase epitaxy has been characterized for its structural and optical properties using x-ray diffraction, defect delineation etch followed by imaging with atomic force microscopy, and variable temperature photoluminescence. The Ga face and the N face of the c-plane GaN exhibited a wide variation in terms of the defect density. The defect concentrations on Ga and N faces were about 5×105 cm−2 for the former and about 1×107 cm−2 for the latter. The full width at half maximum of the symmetric (0002) x-ray diffraction peak was 69 and 160 arc sec …