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Emissivity Measurements And Modeling Of Silicon Related Materials, Vijay Krishnamurthy
Emissivity Measurements And Modeling Of Silicon Related Materials, Vijay Krishnamurthy
Theses
The objective of the thesis was to study the radiative properties of silicon related materials for applications in rapid thermal proceesing. In particular, three distinct materials have been considered - Silicon, SIMOX and Tantalum.
The research highlights are Establishment of spectral emissometry as a novel, reliable and reproducible technique for a) Determination of wavelength and temperature dependent reflectivity, transmissivity, emissivity of silicon related materials and structures. The emissometer operates in the wavelength range of 1-20µm and temperature range of 300-1200K. b) Establishment of methodoligies to obtain the frnndemental constants. Effects of wavelength, temperature, total available free carriers by doping types …
An Interactive System For The Estimation Of Emissivity Of A Wafer In A Rapid Thermal Processing Chamber, Maurizio Fulco
An Interactive System For The Estimation Of Emissivity Of A Wafer In A Rapid Thermal Processing Chamber, Maurizio Fulco
Theses
Rapid thermal processing (RTP) is a method of thermally processing wafers for the manufacture of integrated circuits. During the thermal processing of wafers, it is essential that the wafer temperature follow a pre-specified temperature trajectory and that the temperature across the wafer be uniform especially at high temperatures. To ensure that the above objectives of RTP temperature control be met at any time during the process, the estimation of some parameters of the process is of fundamental importance in the design of the control system.
This thesis demonstrates the implementation of an interactive software system in which the emissivity of …