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Low Temperature Carbon Material Deposition With Photo-Enhanced Chemical Vapor Deposition, Kyungnam Kang
Low Temperature Carbon Material Deposition With Photo-Enhanced Chemical Vapor Deposition, Kyungnam Kang
LSU Doctoral Dissertations
Photo-enhanced chemical vapor deposition (CVD) technique is investigated here for low temperature deposition of carbon nanotubes (CNTs) and hexagonal diamond. Most current deposition methods require high substrate temperature. Photo-enhanced CVD utilizes light energy to dissociate carbon containing precursor molecules and hence has a potential for low temperature deposition. CCl4, having a high absorption coefficient compared to other commonly employed hydrocarbons in the UV emission spectrum from a Xe arc lamp, is selected as a carbon precursor in this work. Extensive experimentation conducted by varying Al/Ni/Al catalyst layer thicknesses on SiO2 coated Si substrates, substrate annealing temperature in the range 350 …