Engineering Commons^™

A Novel Template Stage With Superior Alignment Capability For Nanoimprint And Step And Flash Lithography, Yunmi Jeon

LSU Master's Theses

The high-resolution capabilities of imprinting and step and flash lithography make these techniques strong contenders for the next generation lithography. Unfortunately, alignment remains an area of concern for nanoimprint because it must be completed before the template is moved into contact with the wafer. The large forces on the template during the process, even for step and flash, place additional demands on the stiffness as well as the reproducibility of the template stage. In this thesis, a prototype flexure stage has been developed to meet these demands. A compressive load, slightly below the Euler's limit, is used to produce relatively …