Engineering Commons^™

Schaeffler Icvd Coating Machine, Louis Mcgrath

Williams Honors College, Honors Research Projects

Chemical Vapor Deposition (CVD) is mutual technology used to deposit thin film through a gaseous phase by vaporizing the solid materials. This conventional process usually requires high thermal stability of the materials, which is not applicable for most of the polymeric materials. Therefore, a novel process, initiated Chemical Vapor Deposition (iCVD) is developed by introducing the gaseous monument and initiator to form the thin film in-situ. By adjusting the free-radical polymerization in the vapor phase, a variety of thin and uniform polymer films can be achieved. Depending on the chemistry, iCVD has many categories. This report explains the design …