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Rochester Institute of Technology

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Ferroelectric Thin Films: Preparation Of A Complex Alkoxide Pbzr.5 Ti.5o3 Thin Film, Richard A. Leach Jan 1989

Ferroelectric Thin Films: Preparation Of A Complex Alkoxide Pbzr.5 Ti.5o3 Thin Film, Richard A. Leach

Journal of the Microelectronic Engineering Conference

Ferroelectric thin films were prepared by sd—gel processing. The complex alkoxide was prepared by reacting a Lead (II) salt with Titanium and Zirconium alkoxides in a Methoxyetharkol solvent. The gel was produced using a dilute acid catalysis to hydrolyse the bonds of the complex. The metal alkoxides were Ti/Zr isopropoxides, and Lead salt was a Lead Acetate. Working devices were not fabricated due problems in adhesion, cracking and problems with the viscosity of the gel.

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Growth And Characterization Of Anodic Aluminum Oxide, Cathy Leathersich Jan 1989

Growth And Characterization Of Anodic Aluminum Oxide, Cathy Leathersich

Journal of the Microelectronic Engineering Conference

The growth of anodic aluminum films on silicon was investigated. The films were formed using an electrolytic cell with sulfuric acid and a lead cathode. The effects of electric potential, electrolyte concentration and anneal time were investigated with respect to film thickness, index of refraction and oxide quality with a three level-three factor Box-Behnken designed experiment. The results of the statistical analysis indicated poor repeatability in film qualities as evidenced in ellipsometric and C-V measurements.

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Four Bit Cmos Alu, Frank Leilich Jan 1989

Four Bit Cmos Alu, Frank Leilich

Journal of the Microelectronic Engineering Conference

A four bit CMOS arithmetic logic unit was designed. The design was layed out in ICE (integrated circuit editor).

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The Characterization Of An All Enhancement Pmos Op-Amp, David L. Lewis Jan 1989

The Characterization Of An All Enhancement Pmos Op-Amp, David L. Lewis

Journal of the Microelectronic Engineering Conference

In present day electronic systems a basic building block is the operational amplifier. Therefore, a better understanding of characteristics of Op-Amps and their importance to overall circuit operation is essential. In the electronics industry manufacturers supply data sheets for the IC’s they produce. These data sheets provide a wealth of information: absolute maximum ratings, intended applications, electrical characteristics, performance limitations, equivalent circuits of devices, and more. These defined parameters make the design of more complex systems a much easier task. As do manufacturers in the industry so too must RIT characterize their devices. This project will characterize the important parameters …

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Image Reversal Optimization And A Positive Tone Lift-Off Process With Az5214-E Photoresist, Robert C. Lindstedt Jan 1989

Image Reversal Optimization And A Positive Tone Lift-Off Process With Az5214-E Photoresist, Robert C. Lindstedt

Journal of the Microelectronic Engineering Conference

An optimum reversal process utilizing AZ5214-E photoresist has been defined with respect to profile angle along with statistical modeling of critical variables on the resulting resist profile. A novel positive tone lift-off process was also attempted with AZ5214-E with limited success.

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Greedy Channel Router Implementation In Fortran, Ray S. Linton Jan 1989

Greedy Channel Router Implementation In Fortran, Ray S. Linton

Journal of the Microelectronic Engineering Conference

During this project, the Greedy Channel Router was implemented in FORTRAN. This will allow students to break their general routing problems into channel routing problems to be done by the program. Since many students know FORTRAN, it will also be possible to build on the program and develop a more general router in the future [1].

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Fabrication Of Air-Bridges For Millimeter Wave Integrated Circuits, Antonio L. Luciani Jan 1989

Fabrication Of Air-Bridges For Millimeter Wave Integrated Circuits, Antonio L. Luciani

Journal of the Microelectronic Engineering Conference

High frequencies and sub-micron geometries inherent in today’s millimeter wave integrated circuits mandate utilization of low capacitance cross-over structures such as the air-bridge. A silicon based aluminum air-bridge fabrication process is described. The structure and capacitances associated with these aluminum air-bridges was evaluated for potential use in the fabrication of integrated circuit acoustical disturbance sensors.

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Construction Of A Quasi-Static C-V Test Station, Randall J. Mason Jan 1989

Construction Of A Quasi-Static C-V Test Station, Randall J. Mason

Journal of the Microelectronic Engineering Conference

The construction of a Quasi—Static C—V measurement tool and proper operation are presented. Gate oxides were analyzed for ion implanted regions. Guidelines for obtaining higher quality Quasi—Static C—V measurements will be presented.

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Plasma Etch Optimization Of Silicon Dioxide With A Resist Mask, Eric P. Meister Jan 1989

Plasma Etch Optimization Of Silicon Dioxide With A Resist Mask, Eric P. Meister

Journal of the Microelectronic Engineering Conference

A dry etch process was developed and characterized to etch silicon dioxide (Si02). Characterization included increasing the etch rate o-f Si02 while decreasing the etch rate of a KTIB2O positive photoresist mask, which is used in RIT’s fabrication processes. Successful masking and etching of silicon dioxide occurred with 15 sccm CHF3 mixed with 6 sccm 02 at a chamber pressure of 750 - 800 mtorr and a power of 100 watts.

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Design Of A Eeprom Cell And Thin Oxide Evaluation, Kenneth Obuszewski Jan 1989

Design Of A Eeprom Cell And Thin Oxide Evaluation, Kenneth Obuszewski

Journal of the Microelectronic Engineering Conference

An electrically erasable programmable read only memory (EEPROM) device, utilizing a double polysilicon structure was designed. An extremely thin gate oxide (100 ) was required to allow for Fowler-Nordheim tunneling. Thin oxide polysilicon gate capacitors were fabricated, and evidence of tunneling was existent. However, the oxide integrity was generally poor, and processing did not proceed past this point

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Process Development Of Multilevel Metallization Utilizing National Semiconductor Polyimide El-5510, Ross Patterson Jan 1989

Process Development Of Multilevel Metallization Utilizing National Semiconductor Polyimide El-5510, Ross Patterson

Journal of the Microelectronic Engineering Conference

This project is concerned with double-layer metal using National Polyimide EL-5500 as the of an aluminum /dielectric/ aluminum scheme. The polyimide was an attractive candidate for the dielectric die to its use in trilayer resist schemes. However, results obtained showed incomplete via clear-out.

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Characterization Of Integrated Injection Logic, Tu T. Phan Jan 1989

Characterization Of Integrated Injection Logic, Tu T. Phan

Journal of the Microelectronic Engineering Conference

Integrated Injection Logic gates (IlL) were fabricated at RIT by the use of a double diffused, four mask process. The IlL devices contained neither a buried contact nor an epitaxial layer. The propagation delay time of invertor gates was measured at different injection current levels.

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Fabrication Of A Single Level Metal Ccd Shift Register, Paul F. Picano Jan 1989

Fabrication Of A Single Level Metal Ccd Shift Register, Paul F. Picano

Journal of the Microelectronic Engineering Conference

Using a “shadow mask” technique, a single level metal 3-phase CCD shift register was fabricated with electrode separations of 2.5 microns. Testing is pending at this time.

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Planar Optical Waveguides Using A Silver-Sodium Ion Exchange, V P. Raghavan Jan 1989

Planar Optical Waveguides Using A Silver-Sodium Ion Exchange, V P. Raghavan

Journal of the Microelectronic Engineering Conference

A planar optical waveguide fabrication is reported using a silver-sodium, electric field enhanced, Al thin film masked, ion exchange process. In this study, silver atoms from the thin film replace the sodium ions in soda-lime glass, resulting in a higher index of refraction. It should be noted that soda lime glass was used as a substrate even though it varies in composition, contains metallic impurities and is generally not of optical quality. Problems related with sterling silver and design width are discussed. A better understanding of requirements for coupling light into the waveguide, edge polishing, index profiling, focusing of the …

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Nmos Standard Cell Library, Marco Rivero Jan 1989

Nmos Standard Cell Library, Marco Rivero

Journal of the Microelectronic Engineering Conference

A set of standard nMOS cells was designed following the MOSIS lambda-based design rules, with a lambda of 2.0 microns. The nMOS process was modeled using SUPREM II, and each of the cells was simulated in SPICE. The cells, an inverter, two, three, and four input NANDs and NORs, NAND and NOR RS flip-flops, a 2-bit Multiplexer, and a 2-bit Demultiplexer/Decoder, were designed with ICE, an in house CAD tool.

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Contamination In Rit Processing, Daniel C. Shire Jan 1989

Contamination In Rit Processing, Daniel C. Shire

Journal of the Microelectronic Engineering Conference

Contamination during processing in RIT’S cleanroom facility is a leading cause in the failure of fabricated devices and circuits. Detection of these contaminants is possible using an ESTEK WIS-600 surface inspection system. Before and after particle counts were taken using this system when processing wafers in many common RIT procedures. It was found that contamination levels were significant in most areas, and cleaning procedures were useful only to remove large particles.

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Plasma Damage To Nmos Capacitors, Matthew J. Strong Jan 1989

Plasma Damage To Nmos Capacitors, Matthew J. Strong

Journal of the Microelectronic Engineering Conference

High frequency C-V curves were taken of NMOS capacitors to determine the effect that a RF oxygen plasma has on the underlying thin gate oxide. This plasma was used to remove a positive photoresist. The C-V curves show a threshold voltage shift of 3.75 volts with respect to the undamaged capacitors. The C-V curves also show that the thinner were more affected than the thicker oxides.

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Investigation Of Locos Process Using Nitrogen Implantation, Joseph W. Walters Jan 1989

Investigation Of Locos Process Using Nitrogen Implantation, Joseph W. Walters

Journal of the Microelectronic Engineering Conference

A localized oxidation of silicon (LOCOS) process was investigated using nitrogen ion implantation. The doses of 2E12, 2E13, 2E14, and 1E15 atoms/cm2 were implanted through a photoresist mask using the Varian/Extrion 40-100 ion implanter. The results show the initial formation of a LOCOS oxidation. The localized image faded on extended oxidation which indicates the implanted region did not adequately inhibit the diffusion of oxygen.

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Ion Implantation To Adjust Nmos Threshold Voltages, Matthew A. Wickham Jan 1989

Ion Implantation To Adjust Nmos Threshold Voltages, Matthew A. Wickham

Journal of the Microelectronic Engineering Conference

NMOS processes require a variety of threshold voltages for differing applications. For this experiment, the threshold voltages of NMOS devices were altered by a using several different ion implant doses (none, 1, 2, 4, and 8e12/cm2) of boron. This shifted the threshold voltage in good agreement with literature values [1].

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Integrated Hall Effect Sensor, William H. Wilkinson Jan 1989

Integrated Hall Effect Sensor, William H. Wilkinson

Journal of the Microelectronic Engineering Conference

Experiments relevant to the development an integrated Hall effect sensor have been performed. Carrier concentrations calculated from the Hall voltage generated in samples of bulk silicon did not agree veil with values measured by tour point probe or Van der Pauw techniques. However, the relationship between Hall voltage and magnetic field was highly linear and should produce a well behaved sensor. A sensor design has been proposed, but not fabricated.

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Laser Perforation For Computer Paper, Claude F. Gattuso Jan 1989

Laser Perforation For Computer Paper, Claude F. Gattuso

Theses

In today's computer paper printing, cross and edge perforations are done only by mechanical perforators. The mechanical perforation process works fine since the width of the bridges and the length of the holes to be perforated remain large. Concerned with improvements in quality, printers have introduced microperforations. The holes and bridges of the perforation pattern are so small that after the user has torn off the sheet of computer paper along the perforation pattern, the edges of the document are very smooth and clean. Unfortunately, microperforations are reaching the limits of what can be achieved by the mechanical perforators. Because …

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Coach: A Two Level Expert Planning Assistant For High School Football, Gary F. Hasman Jan 1989

Coach: A Two Level Expert Planning Assistant For High School Football, Gary F. Hasman

Theses

This thesis describes a two level expert planning system that first helps to develop a game plan for a high school football game and then aids in the selection of plays during that game. Built using Rulemaster, an expert system development tool, the system, called COACH, is initially provided observed data through the answering of questions which represents the receiving of a scouting report. This information is stored in a data file for further use. Also created during this questioning period is a data file containing comparisons of key players on the offense against their counterparts on the opponent's defensive …

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Geneplanner: A Prototype Of An Expert System To Assist With Chemical Dna Gene Synthesis Planning, Marilyn Daum Jan 1989

Geneplanner: A Prototype Of An Expert System To Assist With Chemical Dna Gene Synthesis Planning, Marilyn Daum

Theses

Expert systems are a popular area of artificial intelligence. The development of an expert system involves the selection of an appropriate problem, acquisition of knowledge from the expert, selection of control mechanisms and knowledge repre sentations, selection of tools, implementation, and testing. This thesis describes the development of a prototype expert system in the area of genetic engineering. The prototype system suggests the fragments of DNA to chemically synthesize and the steps for joining these fragments in order to make a gene. The system follows the hueristic rules of an expert to select the fragments and strategy for synthesis, backtracking …

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Intelligent Knowledge Acquisition System, Bong-Soo Youn Jan 1989

Intelligent Knowledge Acquisition System, Bong-Soo Youn

Theses

IKAS (Intelligent Knowledge Acquisition System) is an expert system building shell with a machine-assisted concept checker for easy integrated rule-entry. Unlike most expert system shells currently available, IKAS not only performs rule syntax checking, but also maintains semantic integration of the knowledge base by using a Concept Base. The Concept Base is incrementally grown during the cycle of expert system application development and safeguards the whole domain from conceptually conflicting rules by finding possible inconsistencies or duplications of concepts and giving recommendations for possible solutions. Also automatic generalized concept forming using the Inductive Extension Generalization method gives IKAS a capability …

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Implementation Of A Modula 2 Subset Compiler Supporting A 'C' Language Interface Using Commonly Available Unix Tools, Raymond Shear F. Jan 1989

Implementation Of A Modula 2 Subset Compiler Supporting A 'C' Language Interface Using Commonly Available Unix Tools, Raymond Shear F.

Theses

Modula 2 has been proposed as an appropriate language for systems programming. Smaller than PASCAL but more structured than 'C\ Modula 2 is intended to be relatively easy to implement. A realization of a subset of Modula 2 for the MC68010 microprocessor is presented. Widely available UNIX tools and the 'C language are used for the implementation. A mechanism for calling 'C language functions from Modula 2 (and vice versa) is suggested. Critical source code, grammar, and an extensive bibliography pertinent to the implementation are included as appendices.

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1989-1990 Ntid Courses, Rochester Institute Of Technology Jan 1989

1989-1990 Ntid Courses, Rochester Institute Of Technology

RIT Digital Archives

No abstract provided.

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Parametric Splines In Tension, Surendra K. Gupta Jan 1989

Parametric Splines In Tension, Surendra K. Gupta

Theses

A brief review of curve fitting terminology is presented, and the cubic spline interpolation scheme is outlined. Parametric and non-parametric curve fitting techniques are compared. The technique to fit parametric cubic splines is derived using the Euler- Lagrange formulation. Previous work on splines in tension is identified. Employing the notion of splines in tension, a method is proposed to fit a parametric curve to a set of (n + 1) points in ^-dimension space satisfying a specified set of boundary conditions. The curve fitted will not have any inflection points within any span and will be invariant with respect to …

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Ada And The Graphical Kernel System, Richard R. Wessman Jan 1989

Ada And The Graphical Kernel System, Richard R. Wessman

Theses

Since the introduction of the standard language in 1983, Ada has been the subject of controversy about its capabilities and its desirability. Proponents have claimed that Ada may be the ultimate computer language because it is a high-level, structured language that may be used in applications ranging from controlling jet fighters to business. Detractors have argued that Ada's very versatility may be its undoing because it can do many things but not as well as more specialized languages. This thesis attempts to evaluate the capabilities and suitability of Ada for large projects by using it to implement the Graphical Kernel …

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Integration Of Computer-Aided Design Techniques Into The Mechanical Product Development Process, Gerard R. Sturnick Jan 1989

Integration Of Computer-Aided Design Techniques Into The Mechanical Product Development Process, Gerard R. Sturnick

Theses

Computer-Aided Design (CAD) has been called the most significant advance since the development of electricity. CAD is regarded as being the greatest breakthrough of modern times in the search for ways to improve the Product Development Process. This improvement is provided in terms of bringing to market better quality and higher performance products in a significantly shorter design/development cycle and at a lower cost. A survey of the various computer-aided design techniques is presented as they are currently being applied in the mechanical product development process. The research of these techniques includes the basic system operation from a user's perspective, …

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Investigation Of Substructuring Principles In The Finite Element Analysis Of An Automotive Space Structure, John E. Martin Jan 1989

Investigation Of Substructuring Principles In The Finite Element Analysis Of An Automotive Space Structure, John E. Martin

Theses

The efficiency of using substructuring in the dynamic analysis of small models is examined by using a university version of ANSYS to perform a series of four case studies on a small, 648 degree of freedom model. The model is based upon the monocoque center section for an automotive space structure and was constructed using STTF 63 plate elements. In each case study, the model was divided into a different substructure configuration. In the configurations used, the model was divided into one, two, three and four substructures, respectively. In each case study, a series of modal analyses was performed for …

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