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Full-Text Articles in Physical Sciences and Mathematics
Electrochemical Deposition Of Cr From Cr(Iii)-Based [Bmim]Hso4 And Naoac Electrolyte, De-Ying Liu, Wei Luo, Wen-Juan Zhang, Shuo-Zhen Hu, Heng Xu, Xin-Sheng Zhang
Electrochemical Deposition Of Cr From Cr(Iii)-Based [Bmim]Hso4 And Naoac Electrolyte, De-Ying Liu, Wei Luo, Wen-Juan Zhang, Shuo-Zhen Hu, Heng Xu, Xin-Sheng Zhang
Journal of Electrochemistry
Using trivalent chromium ions (Cr(III)) as the chromium source for chromium electrodeposition has attracted much attention since it can reduce the toxicity of the whole process. Even though the chromium deposition in Cr(III)-based ionic liquid bath can avoid the most hydrogen evolution problem, CrCl3·6H2O is widely used as the Cr(III) precursor, which still contains water and has the stable octahedral structure. As a result, it is difficult to deposit Cr and there is still hydrogen evolution reaction (HER). Moreover, the hydroxyl ions (OH-) produced during HER react with Cr3+ to form Cr(OH)3 …
Electrodeposition Of Cobalt From Eutectic-Based Ionic Liquid, Rostom Ali M., Sankar Saha S, Ziaur Rahman Md
Electrodeposition Of Cobalt From Eutectic-Based Ionic Liquid, Rostom Ali M., Sankar Saha S, Ziaur Rahman Md
Journal of Electrochemistry
The electrodeposition of cobalt from a solution containing cobalt chloride in either a urea-choline chloride based or an ethylene glycol (EG)-choline chloride based ionic liquid has been carried out onto copper and steel cathodes by constant current and constant potential methods at different temperatures. The influences of various experimental conditions on electrodeposition and morphology of the deposited layers have been investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD)technique. It has been shown that the smooth, shiny with good adherence and bright metallic coloured cobalt coatings were obtained from both urea and EG based ionic liquids at the applied …
Simulation Of Fractal Growth On Metal Wire Electrode, Li-Feng Ding, Pei-Yuan Mao, Jun Cheng, Yu-Lan Niu, Yu-Hao Wen, Wei Chen
Simulation Of Fractal Growth On Metal Wire Electrode, Li-Feng Ding, Pei-Yuan Mao, Jun Cheng, Yu-Lan Niu, Yu-Hao Wen, Wei Chen
Journal of Electrochemistry
During processes of metal electrodepostion, there exist many complex morphological forms such as dendritic growing in the cathode deposited metal edge, which will seriously affect the quality of the electrodeposited product and current efficiency during machining. Investigations on dendritic crystal growing process and morphology could help controlling growth of electrolysis precipitate. In this work, Python and Matlab softwares were used, and the model of parallel electrode electrodeposition was established based on the diffusion-limited aggregation (DLA) model. By analyzing the law of fractal growth at different conditions of the particles number, probability, electrode spacing, the movement step length and orientation drift, …
Deposition Mechanism And Coating Characterization For The Trivalent Chromium Electrodeposition In Sulphate Electrolyte, Hui Yan, Shuai-Shuai Huang, Fang-Zu Yang, Zhong-Qun Tian, Shao-Min Zhou
Deposition Mechanism And Coating Characterization For The Trivalent Chromium Electrodeposition In Sulphate Electrolyte, Hui Yan, Shuai-Shuai Huang, Fang-Zu Yang, Zhong-Qun Tian, Shao-Min Zhou
Journal of Electrochemistry
Linear sweep voltammetry (LSV) and cyclic voltammetry (CV) were used to study the electrodeposition mechanism of trivalent chromium on a copper electrode in the novel sulphate electrolyte for thick trivalent chromium plating. The thickness, morphology, composition, microhardness, and structure, as well as the corrosion resistance in 3.5wt% NaCl solution of the trivalent chromium coatings were investigated by X-ray fluorescence gage, scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), microhardness tester, X-ray diffraction (XRD) and Tafel curve measurements. The results showed that the electrodeposition of trivalent chromium involved two consecutive one electron reduction steps. The first step, Cr3+ + e …
Electrodeposition Of Cigs Thin Film With Special Structure Using Laser Etching Template, Jin-Zhi Yu, Ye Lian, Jin-Qiu Zhang, Pei-Xia Yang, Mao-Zhong An
Electrodeposition Of Cigs Thin Film With Special Structure Using Laser Etching Template, Jin-Zhi Yu, Ye Lian, Jin-Qiu Zhang, Pei-Xia Yang, Mao-Zhong An
Journal of Electrochemistry
Copper indium gallium selenide (Cu1.00InxGa1-xSe2.00, CIGS) thin film solar cells have a wide application in semiconductor thin film batteries. The CIGS absorbing layer is the key of the thin film solar cell material. Therefore, it is of theoretical and practical significance to carry out researches in CIGS thin films. In this work, the CIGS thin films with special structures were prepared by using laser etching template. The copper thin film was firstly electrodeposited in aqueous solution with Laser etching template. The influences of temperature, current and concentration of copper sulfate on morphology …
Preparation And Properties Of Nanocrystalline Nickel By Pulse Electrodeposition On Glassy Carbon, Ya-Li Zhang, Ming-Xian Zhang, Teng-Da Guo, Yan-Jie Zhao, Sheng-Xue Yu
Preparation And Properties Of Nanocrystalline Nickel By Pulse Electrodeposition On Glassy Carbon, Ya-Li Zhang, Ming-Xian Zhang, Teng-Da Guo, Yan-Jie Zhao, Sheng-Xue Yu
Journal of Electrochemistry
Nanocrystalline nickel exhibits electrocatalytic activity for methanol. In this work, nanocrystalline nickel coating has been obtained by using the double pulse method on glassy carbon materials surface. The influence of pulse conditions on the grain size of nanocrystalline nicke was studied. The concentrations and compositions of the plating bath were 300 g·L-1 NiSO4·6H2O，45 g·L-1 NiCl2·6H2O，40 g·L-1 H3BO3，5 g·L-1 C7H5NO3S，and 0.05 g·L-1 C12H25NaO4S. The optimal pulse process parameters including the average pulse …