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Chemical Vapour Deposition Grown Carbon Nanotubes For Interconnect Technology, R. W. Leahy, E. Lahiff, A Minett, W. J. Blau

Faculty of Science - Papers (Archive)

Multiwall carbon nanotubes have been grown by catalytic chemical vapour deposition using iron catalyst particles drop cast onto etched silicon wafers. The catalyst used was poly(styrene-vinylferrocene) in toluene solution which has an iron content of 2.1%. The etched silicon wafers have trench regions of varying widths ranging from 0.32 to 1 μm. For trench widths below 0.5 μm the number of “interconnecting” tubes growing from one side of the trench to the other increases sharply. A significant proportion of these “interconnects” are found to be Y-junction and multiple junction MWNTs. A systematic study of the effects of each of the …