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Full-Text Articles in Physical Sciences and Mathematics
Regioselective Baeyer–Villiger Oxidation Of Lignin Model Compounds With Tin Beta Zeolite Catalyst And Hydrogen Peroxide, John Adam Jennings, Sean R. Parkin, Eric Munson, Sean Delaney, Julie L. Calahan, Mark Isaacs, Kunlun Hong, Mark Crocker
Regioselective Baeyer–Villiger Oxidation Of Lignin Model Compounds With Tin Beta Zeolite Catalyst And Hydrogen Peroxide, John Adam Jennings, Sean R. Parkin, Eric Munson, Sean Delaney, Julie L. Calahan, Mark Isaacs, Kunlun Hong, Mark Crocker
Chemistry Faculty Publications
Lignin depolymerization represents a promising approach to the sustainable production of aromatic molecules. One potential approach to the stepwise depolymerization of lignin involves oxidation of the benzylic alcohol group in β-O-4 and β-1 linkages, followed by Baeyer–Villiger oxidation (BVO) of the resulting ketones and subsequent ester hydrolysis. Towards this goal, BVO reactions were performed on 2-adamantanone, a series of acetophenone derivatives, and lignin model compounds using a tin beta zeolite/hydrogen peroxide biphasic system. XRD, 119Sn MAS NMR spectroscopy, DRUVS and XPS were used to determine tin speciation in the catalyst, the presence of both framework Sn and extra framework …
Controlled Microfabrication Of High-Aspect-Ratio Structures In Silicon At The Highest Etching Rates: The Role Of H2o2 In The Anodic Dissolution Of Silicon In Acidic Electrolytes, Chiara Cozzi, Giovanni Polito, Kurt W. Kolasinski, Giuseppe Barillaro
Controlled Microfabrication Of High-Aspect-Ratio Structures In Silicon At The Highest Etching Rates: The Role Of H2o2 In The Anodic Dissolution Of Silicon In Acidic Electrolytes, Chiara Cozzi, Giovanni Polito, Kurt W. Kolasinski, Giuseppe Barillaro
Chemistry Faculty Publications
In this work the authors report on the controlled electrochemical etching of high-aspect-ratio (from 5 to 100) structures in silicon at the highest etching rates (from 3 to 10 µm min−1) at room temperature. This allows silicon microfabrication entering a previously unattainable region where etching of high-aspect-ratio structures (beyond 10) at high etching rate (over 3 µm min−1) was prohibited for both commercial and research technologies. Addition of an oxidant, namely H2O2, to a standard aqueous hydrofluoric (HF) acid electrolyte is used to dramatically change the stoichiometry of the silicon dissolution process under anodic biasing without loss of etching control …
Electronic Effects In Oxidation Reactions Utilizing Dinuclear Copper Complexes With The Bis[3-(2-Hydroxybenzylideneamino)Phenyl] Sulfone Ligand, Armando M. Guidote Jr, Ronald L. Reyes, Riyo Kashihara, Yasuhiko Kurusu, Yoshihiro Masuyama
Electronic Effects In Oxidation Reactions Utilizing Dinuclear Copper Complexes With The Bis[3-(2-Hydroxybenzylideneamino)Phenyl] Sulfone Ligand, Armando M. Guidote Jr, Ronald L. Reyes, Riyo Kashihara, Yasuhiko Kurusu, Yoshihiro Masuyama
Chemistry Faculty Publications
Copper acetate and the ligands bis[3-(3-tert-butyl-2-hydroxy-5-methoxybenzylideneamino)phenyl] sulfone and bis[3-(3,5-di-tert-butyl-2-hydroxybenzylideneamino)phenyl] sulfone were reacted to form the complexes with 2:1 copper:ligand ratio, Cu2[B(t-Bu) (OMe)BAPS](µ-OCH3)2 (4) and with 2:2 copper:ligand ratio, Cu2[B(t-Bu)2BAPS]2 (5), respectively. Structures of 4 and 5 were determined based on IR, UV-Vis, and FAB-MS data in comparison with previously characterized related copper complexes. The two complexes 4 and 5 were utilized in the oxidation of the substrates 2,4- and 2,6-di-tertbutylphenol (dtbp) at -50C with H2O2 in CH2Cl2. The coupling products are preferred in both cases. For 2,4-dtbp, yields of 4,600% and 7,200% of 3,3’,5,5’-tetra-tert-butyl-2,2’- biphenol were achieved with the use …