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Full-Text Articles in Physical Sciences and Mathematics
Measuring R And D Productivity, Richard A. Pappas, Donald S. Remer
Measuring R And D Productivity, Richard A. Pappas, Donald S. Remer
All HMC Faculty Publications and Research
Measuring the productivity of an R&D organization is extremely tricky. Productivity is usually defined as a ratio of an output, like number of cars produced on an assembly line, to an input, like the wages paid the workers. While R&D may have a measurable input, the output is often intangible and difficult to quantify. This is further complicated because the return from an R&D department may not be realized for one or two decades,which means the time lag is much higher than in factory measurements. Furthermore, many researchers believe that this kind of measurement may be counterproductive,since the mere act …
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Thermal Stress Analysis, A. Ballantyne, H.A. Hyman, Clive L. Dym, R.C. Southworth
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Thermal Stress Analysis, A. Ballantyne, H.A. Hyman, Clive L. Dym, R.C. Southworth
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This paper examines the effects of thermal loading and time history upon the thermal stresses developed in lithographic mask structures as would be expected under irradiation by intense soft x rays. The objective of this work was to examine the phenomenology of the interaction and to evaluate the limits placed upon mask dosage. The mechanics of mask failure are examined in terms of single pulse and cumulative, or fatigue, effects. A number of prototypical mask structures are investigated, which show that the application of intense pulsed sources to x‐ray lithography does not reduce the potential utility of the techique. However, …
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Dynamic Response, Clive L. Dym, A. Ballantyne
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Dynamic Response, Clive L. Dym, A. Ballantyne
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This paper addresses the issue of the dynamic response of thin lithographic mask structures to thermally induced stress fields. In particular, the impact of repetitively pulsed x‐ray sources are examined: the short duration (1–100 nsec) pulses induce large step changes in mask temperatures, which can, in turn, induce a dynamic response. The impact of conductive cooling of the mask is to reduce the repetitively pulsed problem to a series of isolated nearly identical thermal impulses of duration approximately equal to the cooling time. The importance of self‐weight and prestress is examined, and an analysis of the nonlinear dynamic response to …