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Full-Text Articles in Physical Sciences and Mathematics
Characterization Of Optical Constants For Uranium From 10 To 47 Nm, Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Characterization Of Optical Constants For Uranium From 10 To 47 Nm, Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Faculty Publications
We use a laser high-harmonics-based extreme-ultraviolet (EUV) polarimeter to determine the optical constants of elemental uranium in the wavelength range from 10 to 47 nm. The constants are extracted from the measure ratio of p-polarized to s-polarized reflectance from a thin uranium film deposited in situ. The film thickness is inferred from a spectroscopic ellipsometry measurement of the sample after complete oxidation in room air. Uranium has been used as a high-reflectance material in the EUV. However, difficulties with oxidation prevented its careful characterization previous to this study. We find that measured optical constants for uranium vary significantly from previous …
Extreme Ultraviolet Polarimetry With Laser-Generated High-Order Harmonics: Characterization Of Uranium, Nicole Brimhall
Extreme Ultraviolet Polarimetry With Laser-Generated High-Order Harmonics: Characterization Of Uranium, Nicole Brimhall
Theses and Dissertations
We developed an extreme ultraviolet (EUV) polarimeter, which employs laser-generated high-order harmonics as the light source. This relatively high-flux, directional EUV source has available wavelengths between 10 nm and 47 nm with easily rotatable linear polarization. The polarimeter has allowed us to characterize the optical constants of materials that may be useful for EUV optics. The instrument has a versatile positioning system and a spectral resolution of about 180, and we have demonstrated that reflectance as low as 0.1% can be measured repeatably at EUV wavelengths. We investigate the high harmonic source used for polarimetry measurements by documenting the spatial …
Scandium Oxide Thin Films And Their Optical Properties In The Extreme Ultraviolet, Guillermo Antonio Acosta
Scandium Oxide Thin Films And Their Optical Properties In The Extreme Ultraviolet, Guillermo Antonio Acosta
Theses and Dissertations
This study reports on the physical and optical characterization of scandium oxide thin films. Thin films of scandium oxide, 20-40 nm thick, were deposited on silicon wafers, quartz slides, and silicon photodiodes by reactively sputtering scandium in an oxygen environment. These samples were characterized using ellipsometry, high-resolution transmission electron microscopy, scanning transmission electron microscopy, and energy dispersive x-ray analysis. A 28.46 nm thick scandium oxide thin film was measured in the Extreme Ultraviolet (EUV) from 2.7 to 50 nm (459.3 to 24.8 eV) using synchrotron radiation at the Advanced Light Source Beamline 6.3.2 at the Lawrence Berkeley National Laboratory. In …
Extreme Ultraviolet Polarimetry With Laser-Generated High-Order Harmonics, Nicole Brimhall
Extreme Ultraviolet Polarimetry With Laser-Generated High-Order Harmonics, Nicole Brimhall
Theses and Dissertations
We developed an extreme ultraviolet (EUV) polarimeter, which employs laser-generated high-order harmonics as the light source. This relatively high-flux directional EUV source has available wavelengths between 8 nm and 62 nm and easily rotatable linear polarization. The polarimeter will aid researchers at BYU in characterizing EUV thin films and improving their understanding of materials for use in EUV optics. This first-time workhorse application of laser high harmonics enables polarization-sensitive reflection measurements not previously available in the EUV. We have constructed a versatile positioning system that places harmonics on the microchannel plate detector with an accuracy of 0.3 mm, which allows …
Optical Properties And Application Of Uranium-Based Thin Films For The Extreme Ultraviolet And Soft X-Ray Region, Richard L. Sandberg, David D. Allred, Shannon Lunt, Marie K. Urry, R. Steven Turley
Optical Properties And Application Of Uranium-Based Thin Films For The Extreme Ultraviolet And Soft X-Ray Region, Richard L. Sandberg, David D. Allred, Shannon Lunt, Marie K. Urry, R. Steven Turley
Faculty Publications
Uranium oxide and uranium nitride thin films reflect significantly more than all previously known/standard reflectors (e.g., nickel, gold, and iridium) for most of the 4-10 nm range at low angles of incidence. This work includes measurements of the EUV/soft x-ray (2-20 nm) reflectance of uranium-based thin films (~20 nm thick) and extraction of their optical constants (d and ?). We report the reflectances at 5, 10, and 15 degrees grazing incidence of air-oxidized sputtered uranium, reactively sputtered (O2) uranium oxide, and reactively sputtered (N2) uranium nitride thin films measured at Beamline 6.3.2 at the Advanced Light Source (ALS) at Lawrence …