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Fundamental Aspect And Behavior Of Saturated Fluorocarbons In Glow Discharge In Absence Of Potential Source Of Hydrogen, Yu Iriyama, H. Yasuda

Chemistry Faculty Research & Creative Works

The glow discharge of a series of saturated fluorocarbons, C_nF_2n+2 (n = 1, 2, 4, 6, and 8), was studied with glass substrates which do not contain any hydrogen. It was found that the deposition rate was a function of the F/C ratio of the starting fluorocarbons. That is, fluorocarbons with higher F/C ratio, such as CF₄ and C₂F₆, hardly polymerized, while fluorocarbons with lower F/C ratio, such as C₈F₁₈, polymerized as well as C₂F₄. After plasma exposure, the surface of glass substrate was …