Physical Sciences and Mathematics Commons^™

Emissivity Of Patterned Silicon Wafers In Rapid Thermal Processing, Markus Rabus

Theses

The influence of patterns on emissivity in silicon wafers in rapid thermal processing systems has been investigated. In this study, two experiments with layered and patterned silicon wafers were conducted. The main difference in the experiments is the way in which the temperature was controlled. The first experiment was performed under Open Loop Intensity Control (OLIC). For OLIC, no feedback from the wafer is returned. It is assumed that supplying a certain power level will lead to the desired temperature. The other experiment used the Closed Loop Intensity Control. In this case, a feedback, in the form of temperature deviation …