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Properties Of High Nitrogen Content Carbon Nitride Thin Films Prepared By A Radio Frequency Magnetron Sputtering Deposition Technique, David Pipher
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The properties of carbon nitride (CNx) films deposited onto various substrates using a radiofrequency magnetron sputtering technique were studied as a function of deposition parameters, especially magnetron power, gas pressure and nitrogen content in the plasma. Indium tin oxide (ITO) coated glass and fluorine tin oxide (FTO) coated glass as well as metal substrates (silver and tungsten) were used. Scanning electron microscopy (SEM) was used to study the surface morphology of the prepared CNx films. Energy-dispersive X-ray spectroscopy (EDX) as well as survey X-ray photoelectron spectroscopy (XPS) spectra were used to perform the elemental analysis of the CNx films.
Ultraviolet-visible …