Physical Sciences and Mathematics Commons^™

Removing Surface Contaminants From Silicon Wafers To Facilitate Euv Optical Characterization, Richard L. Sandberg, David D. Allred, A. L. Jackson, J. E. Johnson, W. Evans, T. Doughty, A. E. Baker, K. Adamson, A. Jacquier, R. E. Robinson

Faculty Publications

The extreme ultraviolet (EUV) is becoming increasingly important. Principal applications include orbital space-based astronomy and lithography for integrated circuit computer chips. A main impediment to further development of efficient mirrors is the lack of reliable optical constants for various materials in this region of the electromagnetic spectrum. One reason for the unreliability of the optical constants is that the sample surfaces are often contaminated with foreign material, especially organic compounds, when exposed to laboratory air. Several cleaning techniques were evaluated, namely: 1) strippable solid optical cleaner (Opticlean®); 2) oxygen plasma etch; 3) high energy UV light/ozone; 4) strippable coating followed …