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Investigation Of Low-Stress Silicon Nitride As A Replacement Material For Beryllium X-Ray Windows, David B. Brough
Investigation Of Low-Stress Silicon Nitride As A Replacement Material For Beryllium X-Ray Windows, David B. Brough
Theses and Dissertations
The material properties of low stress silicon nitride make it a possible replacement material for beryllium in X-ray windows. In this study, X-ray windows made of LPCVD deposited low stress silicon nitride are fabricated and characterized. The Young's modulus of the LPCVD low stress silicon nitride are characterized and found to be 226±23 GPa. The residual stress is characterized using two different methods and is found to be 127±25 MPa and 141±0.28 MPa. Two support structure geometries for the low stress silicon nitride X-ray windows are used. X-ray windows with thicknesses of 100 nm and 200 nm are suspended on …