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Full-Text Articles in Physical Sciences and Mathematics
Characterization Of Optical Constants For Uranium From 10 To 47 Nm, Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Characterization Of Optical Constants For Uranium From 10 To 47 Nm, Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Faculty Publications
We use a laser high-harmonics-based extreme-ultraviolet (EUV) polarimeter to determine the optical constants of elemental uranium in the wavelength range from 10 to 47 nm. The constants are extracted from the measure ratio of p-polarized to s-polarized reflectance from a thin uranium film deposited in situ. The film thickness is inferred from a spectroscopic ellipsometry measurement of the sample after complete oxidation in room air. Uranium has been used as a high-reflectance material in the EUV. However, difficulties with oxidation prevented its careful characterization previous to this study. We find that measured optical constants for uranium vary significantly from previous …
Optical Properties And Application Of Uranium-Based Thin Films For The Extreme Ultraviolet And Soft X-Ray Region, Richard L. Sandberg, David D. Allred, Shannon Lunt, Marie K. Urry, R. Steven Turley
Optical Properties And Application Of Uranium-Based Thin Films For The Extreme Ultraviolet And Soft X-Ray Region, Richard L. Sandberg, David D. Allred, Shannon Lunt, Marie K. Urry, R. Steven Turley
Faculty Publications
Uranium oxide and uranium nitride thin films reflect significantly more than all previously known/standard reflectors (e.g., nickel, gold, and iridium) for most of the 4-10 nm range at low angles of incidence. This work includes measurements of the EUV/soft x-ray (2-20 nm) reflectance of uranium-based thin films (~20 nm thick) and extraction of their optical constants (d and ?). We report the reflectances at 5, 10, and 15 degrees grazing incidence of air-oxidized sputtered uranium, reactively sputtered (O2) uranium oxide, and reactively sputtered (N2) uranium nitride thin films measured at Beamline 6.3.2 at the Advanced Light Source (ALS) at Lawrence …