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Effect Of Paired Apertures In A Periodic Hole Array On Higher Order Plasmon Modes, Fang-Tzu Chuang
Effect Of Paired Apertures In A Periodic Hole Array On Higher Order Plasmon Modes, Fang-Tzu Chuang
Fang-Tzu Chuang
We demonstrate that the transmission of higherorder surface plasmon modes in the mid-infrared range can be enhanced through rectangular hole array on the basis of paired apertures. Experiments prove that enhanced high-order transmission can be generated by either identical shapes or combinations of different hole shapes in pairs. The structure factor is adopted to explain the observed intensity of enhanced transmission. Numerical simulations of the enhanced secondorder mode verify a significant field enhancement in a unit cell of pairs. It is clarified that the separation between the paired apertures and the paired resonance is the key to determine certain higher-order …
Two Infrared Emission Modes With Different Wavelengths And Orthogonal Polarization In A Waveguide Thermal Emitter, Fang-Tzu Chuang
Two Infrared Emission Modes With Different Wavelengths And Orthogonal Polarization In A Waveguide Thermal Emitter, Fang-Tzu Chuang
Fang-Tzu Chuang
This study investigates a Au/SiO2/Au waveguide thermal emitter incorporating a metallic grating embedded in the SiO2 layer. The metal grating acts as a beam splitter, dividing the device into two waveguide structures determined by the polarization of the waveguide modes. The thermal radiation spectrum exhibits two peaks with orthogonal polarization. The emitted wavelengths of the two waveguide modes can be adjusted by controlling the thickness of the SiO2 layers on both sides of the metallic grating during the fabrication process. The emission peaks have ratios of the full width at half maximum to the peak wavelength of 0.057 and 0.05 …
Nanoprojection Lithography Using Self-Assembled Interference Modules For Manufacturing Plasmonic Gratings, Fang-Tzu Chuang
Nanoprojection Lithography Using Self-Assembled Interference Modules For Manufacturing Plasmonic Gratings, Fang-Tzu Chuang
Fang-Tzu Chuang
Abstract—A new nanoprojection lithography (NPL) is proposed to manufacture plasmonic nanogratings. Here, low-cost self-assembly elastomeric polydimethylsiloxane wavy structures are used as the interference modules, with their periods and amplitudes largely controlled by the applied mechanical strain in the synthesis process. Well defined plasmonic grating couplers with desired feature sizes and wavelengths of operation were obtained. This NPL may enable large-area and flash manufacturing of plasmonic nanogratings with tunable array periods.