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Full-Text Articles in Life Sciences
A Straightforward Scanning Electron Microscopy Technique For Examining Non-Metal Coated Dental Hard Tissues, S. M. Mccormack, F. J. Tormo, J. D. B. Featherstone
A Straightforward Scanning Electron Microscopy Technique For Examining Non-Metal Coated Dental Hard Tissues, S. M. Mccormack, F. J. Tormo, J. D. B. Featherstone
Scanning Microscopy
Modifications to the standard operating settings for accelerating voltage , condenser lens current, scan rate, working distance and tilt on the conventional scanning electron microscope (SEM) enabled non-metal coated dental hard tissues and synthetic apatite pellets to be viewed free of charging effects . Well -resolved images at magnifications as high as 35,000x were achieved using accelerating voltages less than 5 kV . The methodology detailed here allowed for serial SEM examination of the same sample at various points during an experimental procedure , and may be applied to other sample types. The procedure is non-destructive to the sample and …
Electron Beam Lithography For Large Area Patterning 2: Exposure Characteristics Of Electrodeposited Thick Resist, Susumu Hoshinouchi, Akio Yoshida, Akinobu Kawazu, Kohichi Sakurai, Hidenobu Murakami, Ryuichi Shimizu
Electron Beam Lithography For Large Area Patterning 2: Exposure Characteristics Of Electrodeposited Thick Resist, Susumu Hoshinouchi, Akio Yoshida, Akinobu Kawazu, Kohichi Sakurai, Hidenobu Murakami, Ryuichi Shimizu
Scanning Microscopy
Exposure characteristics of a large field deflection electron beam lithography system have been examined. Thick film mainly composed of unsaturated acrylic resins and prepared by electrodeposition process is proposed as a resist available to large area patterning. It is proved that the 20 μm thick resist is very sensitive to 60 kV electron beam and has the threshold dosage of 2.0 x 10-7 C/cm2. The spatial contours of equienergy density deposited by electron beam in a 20 μm thick resist on a semi-infinite thick copper substrate are calculated by Monte Carlo simulation for a line source with …