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Full-Text Articles in Engineering
Managing Lithographic Variations In Design, Reliability, And Test Using Statistical Techniques, Aswin Sreedhar
Managing Lithographic Variations In Design, Reliability, And Test Using Statistical Techniques, Aswin Sreedhar
Open Access Dissertations
Much of today's high performance computing engines and hand-held mobile devices are products of aggressive CMOS scaling. Technology scaling in semiconductor industry is mainly driven by corresponding improvements in optical lithography technology. Photolithography, the art used to create patterns on the wafer is at the heart of the semiconductor manufacturing process. Lately, improvements in optical technology have been difficult and slow. The transition to deep ultra-violet (DUV) light source (193nm) required changes in lens materials, mask blanks, light source and photoresist. It took more than ten years to develop a stable chemically amplified resist (CAR) for DUV. Consequently, as the …
Electromagnetic Modeling Of Photolithography Aerial Image Formation Using The Octree Finite Element Method, Seth A. Jackson
Electromagnetic Modeling Of Photolithography Aerial Image Formation Using The Octree Finite Element Method, Seth A. Jackson
Masters Theses 1911 - February 2014
Modern semiconductor manufacturing requires photolithographic printing of subillumination wavelength features in photoresist via electromagnetic energy scattered by complicated photomask designs. This results in aerial images which are subject to constructive and destructive wave interference, as well as electromagnetic resonances in the photomask features. This thesis proposes a 3-D full-wave frequency domain nonconformal Octree mesh based Finite Element Method (OFEM) electromagnetic scattering solver in combination with Fourier Optics to accurately simulate the entire projection photolithography system, from illumination source to final image intensity in the photoresist layer. A rapid 1-irregular octree based geometry model mesher is developed and shown to perform …