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Full-Text Articles in Engineering
Phase Behavior Of Block Copolymers In Compressed Co2 And As Single Domain-Layer, Nanolithographic Etch Resists For Sub-10 Nm Pattern Transfer, Curran Matthew Chandler
Phase Behavior Of Block Copolymers In Compressed Co2 And As Single Domain-Layer, Nanolithographic Etch Resists For Sub-10 Nm Pattern Transfer, Curran Matthew Chandler
Open Access Dissertations
Diblock copolymers have many interesting properties, which first and foremost include their ability to self-assemble into various ordered, regularly spaced domains with nanometer-scale feature sizes. The work in this dissertation can be logically divided into two parts - the first and the majority of this work describes the phase behavior of certain block copolymer systems, and the second discusses real applications possible with block copolymer templates. Many compressible fluids have solvent-like properties dependent on fluid pressure and can be used as processing aids similar to liquid solvents. Here, compressed CO2 was shown to swell several thin homopolymer films, including …
Gpu Based Lithography Simulation And Opc, Lokesh Subramany
Gpu Based Lithography Simulation And Opc, Lokesh Subramany
Masters Theses 1911 - February 2014
Optical Proximity Correction (OPC) is a part of a family of techniques called Resolution Enhancement Techniques (RET). These techniques are employed to increase the resolution of a lithography system and improve the quality of the printed pattern. The fidelity of the pattern is degraded due to the disparity between the wavelength of light used in optical lithography, and the required size of printed features. In order to improve the aerial image, the mask is modified. This process is called OPC, OPC is an iterative process where a mask shape is modified to decrease the disparity between the required and printed …