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Full-Text Articles in Engineering
Gpu Based Lithography Simulation And Opc, Lokesh Subramany
Gpu Based Lithography Simulation And Opc, Lokesh Subramany
Masters Theses 1911 - February 2014
Optical Proximity Correction (OPC) is a part of a family of techniques called Resolution Enhancement Techniques (RET). These techniques are employed to increase the resolution of a lithography system and improve the quality of the printed pattern. The fidelity of the pattern is degraded due to the disparity between the wavelength of light used in optical lithography, and the required size of printed features. In order to improve the aerial image, the mask is modified. This process is called OPC, OPC is an iterative process where a mask shape is modified to decrease the disparity between the required and printed …
On Process Variation Tolerant Low Cost Thermal Sensor Design, Spandana Remarsu
On Process Variation Tolerant Low Cost Thermal Sensor Design, Spandana Remarsu
Masters Theses 1911 - February 2014
Thermal management has emerged as an important design issue in a range of designs from portable devices to server systems. Internal thermal sensors are an integral part of such a management system. Process variations in CMOS circuits cause accuracy problems for thermal sensors which can be fixed by calibration tables. Stand-alone thermal sensors are calibrated to fix such problems. However, calibration requires going through temperature steps in a tester, increasing test application time and cost. Consequently, calibrating thermal sensors in typical digital designs including mainstream desktop and notebook processors increases the cost of the processor. This creates a need for …
Electromagnetic Modeling Of Photolithography Aerial Image Formation Using The Octree Finite Element Method, Seth A. Jackson
Electromagnetic Modeling Of Photolithography Aerial Image Formation Using The Octree Finite Element Method, Seth A. Jackson
Masters Theses 1911 - February 2014
Modern semiconductor manufacturing requires photolithographic printing of subillumination wavelength features in photoresist via electromagnetic energy scattered by complicated photomask designs. This results in aerial images which are subject to constructive and destructive wave interference, as well as electromagnetic resonances in the photomask features. This thesis proposes a 3-D full-wave frequency domain nonconformal Octree mesh based Finite Element Method (OFEM) electromagnetic scattering solver in combination with Fourier Optics to accurately simulate the entire projection photolithography system, from illumination source to final image intensity in the photoresist layer. A rapid 1-irregular octree based geometry model mesher is developed and shown to perform …