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Deep Level Defects In N-Type Gan Grown By Molecular Beam Epitaxy, C. D. Wang, L. S. Yu, S. S. Lau, E. T. Yu, W. Kim, A. E. Botchkarev, Hadis Morkoç

Electrical and Computer Engineering Publications

Deep-level transient spectroscopy has been used to characterize electronic defects in n-type GaN grown by reactive molecular-beam epitaxy. Five deep-level electronic defects were observed, with activation energiesE1=0.234±0.006, E2=0.578±0.006, E3=0.657±0.031, E4=0.961±0.026, and E5=0.240±0.012 eV. Among these, the levels labeled E1, E2, and E3are interpreted as corresponding to deep levels previously reported in n-GaN grown by both hydride vapor-phase epitaxy and metal organic chemical vapor deposition. Levels E4 and E5do not correspond to any previously reported defect levels, and are characterized for the first time in our studies.