Engineering Commons^™

Development Of Nanostructures By Atomic And Molecular Layer Deposition, Andrew P. Lushington

Electronic Thesis and Dissertation Repository

Atomic layer deposition (ALD) is a thin film deposition technique that has a rich history of being an enabling technique. This vapor phase deposition process can produce a variety of thin films and nanostructures. ALD is based on sequential, self-limiting reactions and provides angstrom level control over film growth. Furthermore, ALD allows for conformal deposition on high-aspect ratio structures and can provide tunable film composition. As nanotechnology marches forward, the development of nanomaterials has significantly advanced. Additional functionality can be imparted to nanomaterials by using surface modification techniques. Given the advantages of ALD, this technique has become a powerful tool …