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Development Of Nanostructures By Atomic And Molecular Layer Deposition, Andrew P. Lushington
Development Of Nanostructures By Atomic And Molecular Layer Deposition, Andrew P. Lushington
Electronic Thesis and Dissertation Repository
Atomic layer deposition (ALD) is a thin film deposition technique that has a rich history of being an enabling technique. This vapor phase deposition process can produce a variety of thin films and nanostructures. ALD is based on sequential, self-limiting reactions and provides angstrom level control over film growth. Furthermore, ALD allows for conformal deposition on high-aspect ratio structures and can provide tunable film composition. As nanotechnology marches forward, the development of nanomaterials has significantly advanced. Additional functionality can be imparted to nanomaterials by using surface modification techniques. Given the advantages of ALD, this technique has become a powerful tool …
Application Of Molecular Layer Deposition For Graphite Anodes In Lithium-Ion Batteries And Porous Thin-Film Materials, Craig L. Langford
Application Of Molecular Layer Deposition For Graphite Anodes In Lithium-Ion Batteries And Porous Thin-Film Materials, Craig L. Langford
Electronic Thesis and Dissertation Repository
With climate change occurring because of greenhouse gas emissions, the demand for emission free transportation has led to the development of electric vehicles. Improving the batteries’ cycling stability, capacity and safety have been the leading challenges to compete with gasoline and diesel engines. With advances in thin-film deposition techniques via atomic and molecular layer deposition, ultrathin films can be deposited to control the surface chemistry of the battery’s active materials. This thesis aims to understand two main aspects of molecular layer deposition. First, how it can influence solid electrolyte interface formation on the graphite surface during cycling in a lithium-ion …