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Guiding The Self-Assembly Of Block Copolymers In 2d And 3d With Minimal Patterning, Jaewon Choi
Guiding The Self-Assembly Of Block Copolymers In 2d And 3d With Minimal Patterning, Jaewon Choi
Doctoral Dissertations
Directed self-assembly (DSA) of block copolymers (BCPs) based on topographic patterns is one of the most promising strategies for overcoming resolution limitations in the current lithographic process and fabricating the next generation data storage devices. While the DSA of BCPs with deep topographic patterning has been extensively studied both experimentally and theoretically over the past two decades, less attention has been paid to the development of the DSA process using minimal topographic patterning. This dissertation focuses on understanding the effect of minimal topographic patterning on guiding the self-assembly of BCPs in 2D and 3D. We demonstrate that minimal trench patterns …
The Self-Assembly Of Lamellae-Forming Block Copolymer For High Resolution Nanolithography, Zhiwei Sun
The Self-Assembly Of Lamellae-Forming Block Copolymer For High Resolution Nanolithography, Zhiwei Sun
Doctoral Dissertations
This thesis will be focused on the thin film self-assembly and high resolution nanolithography of lamellae-forming PS-b-P2VP block copolymer. Some of the scientific and engineering problems of block copolymer self-assembly will be studied using the state-of-the-art characterization facilities including AFM, SEM and synchrotron radiation X-ray scattering, pushing forward the application of block copolymer in high resolution nanolithography, storage media, and separation membranes, etc. The first challenge is the design of BCP with small domain spacing, which defines the resolution of BCP nanolithography. Small domain spacing can be achieved by reducing the degree of polymerization, but order-to-disorder transition happens …