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Structure And Morphology Of Photoreactive Monomer–Nanoparticle Mixtures Under Patterned Irradiation, Shreyas Pathreeker
Structure And Morphology Of Photoreactive Monomer–Nanoparticle Mixtures Under Patterned Irradiation, Shreyas Pathreeker
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Establishing processing–structure relationships is central to materials science. In this work, we seek answers to whether morphology can be controlled during Light–Induced Self–Writing (LISW) in polymer composite materials, and if yes, how? LISW is based on the ability of light to undergo divergence–free propagation in photoreactive media due to photopolymerization–induced rise in refractive index of the medium. Notably, LISW in polymeric materials has found use predominantly for the fabrication of optical waveguides but has not been explored in polymer–inorganic mixtures. Using through–mask projection which creates a spatially periodic array of optical beams, this work extends LISW to nanoparticle–monomer mixtures to …