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Missouri University of Science and Technology
<p>Chemical vapor deposition<br />Chemical kinetics<br />Boron<br />Molybdenum</p>
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Initial Surface Reactions And Nucleation Kinetics Of Boron On Atomically Clean Molybdenum Substrates, Richard Eugene Moore
Initial Surface Reactions And Nucleation Kinetics Of Boron On Atomically Clean Molybdenum Substrates, Richard Eugene Moore
Doctoral Dissertations
"A study of the chemical vapor deposition (CVD) of boron from boron triiodide (BI3) on molybdenum has been done with field emission microscopy (FEM) and low energy electron diffraction (LEED).
A correlation of the efficiency by which BI3 is effectively dissociated to form adsorbed boron, and the temperature of the substrate has been shown through work function measurements on the boron covered molybdenum field emitter surfaces. The boron-induced work function change of molybdenum has been shown to be in agreement with a theoretical model which predicts positive, as well as negative work functions for adsorbate-substrate systems. It …