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Thin-Film Block Copolymers (Bcps) Self-Assembly As Versatile Patterning Scheme For Functional Nanomaterials, Le Zhang
LSU Master's Theses
Nanopattern generation is required for building various structural entities in every production process that involves nanostructures. Advancing nanopatterning technologies play an important role in developing and broadening the current nanopatterning technologies to meet up with the ever-demanding requirements in the realm of smaller feature sizes, smoother line-edge roughness (LER) and facile pattern transfer in pursuit of faster computer processors, better electrocatalysts and more compact and intelligent sensors, etc. Conventionally, patterning needs are heavily relied on photolithography, a technique that dominate chip-making industry for more than 50 years. However conventional photolithography is bounded by inherent resolution limits and difficult to be …