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Surface Reflection Hyperthermal Neutral Stream Source, Christopher A. Nichols

Dissertations, Theses, and Masters Projects

A novel source of hyperthermal (1-30 eV) reactive neutrals based on the surface-reflection-neutralization technique is described. This source is potentially capable of minimizing the charge-induced damage associated with plasma based semiconductor processing steps. The goal of this thesis is to investigate the issues involved in scale-up of this technology for processing of 8{dollar}\sp{lcub}\prime\prime{rcub}{dollar} diameter wafers used today in the semiconductor industry. This includes modeling the plasma ion source and trajectory simulations of the reflected neutral flux. A prototype source was constructed for experimental verification of the plasma model.;An inductively coupled plasma (ICP) source is used to provide a source of …