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Growth Kinetics And Breakdown Of Passive Films On Rebar Electrodes In Simulated Cement Pore Solution, Wei Chu, Yuanxiang Shi, Baoming Wei
Growth Kinetics And Breakdown Of Passive Films On Rebar Electrodes In Simulated Cement Pore Solution, Wei Chu, Yuanxiang Shi, Baoming Wei
Journal of Electrochemistry
The growth kinetics and breakdown of passive films on REBAR electrodes insimulated cement solution(pH=12.5 and 13.8)have been investigated using in situphotoelectrochemical methods and potential step method. The results show that there are two mainstages in the growth of the film ,with two rate functions characterized by linear relation between thefilm thickness and the direct logarithm of time. There is a sign in laser-scanning photoelectrochemicalmicroscopic image just before the passive film breaks down. The addition of inhibitor NaNO_2changesthe growth kinetics and thickness of the film ,and therefore improves the resistance of pitting corrosioninduced by chloride.
The Photoelectrochemical Studies Of Passive Films On Rebar Electrodes In Simulated Cement Pore Solution, Wei Chu, Yuanxiang Shi, Baoming Wei
The Photoelectrochemical Studies Of Passive Films On Rebar Electrodes In Simulated Cement Pore Solution, Wei Chu, Yuanxiang Shi, Baoming Wei
Journal of Electrochemistry
The electronic properties of the passive film on REBAR electrodes in simulatedcement pore solution(pH=9.0～13.8)have been investigated using in-situ photoelectrochemicalmethods.The results show that the passive film is composed of mixed oxides of ferrum ,and it is anamorphous,n-type semiconductive film. Variations of pH values,ions in the solution and film-formation potentials can affect the composition of the films. There are two main stages in the growthof the film,with two rate functions characterized by linear relation between the film thickness and thelogarithm of time.The addition of inhibitor NaNO_2 changes the composition,structure and growthkinetics of the film,and therefore improves the resistance of pitting corrosion induced …