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Impact Of Sulfurization On Sputtered Bivo4 Thin Films, Shukur P. Gofurov, Dilbar T. Bozorova, Zuhra Ch, Kadirova, Oksana Ismailova
Impact Of Sulfurization On Sputtered Bivo4 Thin Films, Shukur P. Gofurov, Dilbar T. Bozorova, Zuhra Ch, Kadirova, Oksana Ismailova
CHEMISTRY AND CHEMICAL ENGINEERING
The sulfurization method has been used to decrease the band gap of the BiVO4 structure, reduce the recombination of electrons and holes, and increase the photoelectrochemical performance of this material. It has been observed that incorporation of sulfur into stoichiometric and Vrich BiVO4 is variously affected changing of properties of the structure. Sulfurization can modify Vrich BiVO4 structure rather than stoichiometric BiVO4.