Engineering Commons^™

Chemical Vapor Deposition Of Polymeric Films, Chi Yu

Theses

Poly-peri-naphthalene (PPN) is a one-dimensional (1 -D) graphite polymer with unique planar ladder-like conjugated molecular structure. PPN was predicted to be a good intrinsic conductor and have high thermal stability and high environmental stability.

In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of PPN films by PECVD process, which may allow deposition at a higher rate with lower substrate temperature. In this work the influence of deposition parameters, …

Synthesis And Characterization Of Lpcvd Boron Nitride Films For X-Ray Lithography, Wen-Pin Kuo

Theses

Boron nitride thin films were deposited on silicon and fused quartz substrates using ammonia and the liquid precursor borane-triethylamine complex (TEAB) by low pressure chemical vapor deposition over a temperature range of 300-850°C, a pressure range of 0.21-0.6 torr, and an ammonia flow rate range of 0-740 sccm. An increased in the nitrogen content in the film due to the addition of ammonia flow resulted in a pronounced improvement in the optical transmission, an increase in the film uniformity and a decrease in the depletion effect. IR spectra of the films showed an asymmetrical wide band centered around 1400 cm …