Engineering Commons^™

Effects Of Implementation Of Decaborane Ions In Silicon, Cheng Li

Dissertations

The next generations of Si microelectronic devices will require ultra shallow p-type junctions formed by implantation of B ions with energies below 1 keV, at which available beam currents are severely limited by space charge effects. To solve this problem, decaborane (B₁₀H₁₄) cluster ion implantation has been suggested as an attractive alternative to conventional B implants, because one decaborane ion implants ten B atoms simultaneously and each of the B atoms only carries approximately 1/11 of the total ion energy. Thus the same implantation depth and dose as with monomer B ions can be obtained using …

Process-Structure-Property Relationship Of A Mesogenic Bioerodible Polyarylate, Seung Uk Yoo

Theses

Polymeric biomaterials are artificially synthesized polymers designed for in-vivo use. The material must be characterized and should satisfy the requirements suitable in human bodies.

For the proper characterization of materials, it is essential to apply specific processes, analyze thermal and mechanical properties, and understand the process effect and the morphology. Thermal analysis is one of the most sophisticated and well developed techniques for polymer characterization. Turi [ 1 ] has explained about the thermal characterization of polymeric materials. Jaffe et al [2], in the chapters of characterization of fibers and films, emphasized the effect of the process history of a …

Characterization And Corrosion Of Bcc-Tantalum Coating Deposited On Aluminum And Steel Substrate By Dc Magnetron Sputtering, Chirag Joshi

Theses

Tantalum is one of the most versatile highly refractory corrosion-resistant metals. Tantalum coating can be used as an effective corrosion barrier if it is continuous, free from defects and it adheres well to the substrate. A DC magnetron sputtering technique was used to deposit tantalum on aluminum and steel. X-ray diffraction measurements revealed that the tantalum films produced by sputtering had two crystallographic structures: a body centered cubic α-phase and a metastable tetragonal β-phase. Tough and ductile alpha phase tantalum is preferred over the hard and brittle beta phase tantalum, as a protective coating. Alpha phase coatings were successfully deposited …

In Situ Laser Etch-Depth Monitoring Of The Deep Reactive Ion Etching Process, Yuki Imura

Theses

A laser-based method for measuring feature thickness during the deep reactive ion etching process is investigated. Interference occurs between laser beam reflections from the mask surface, the mask/silicon interface, and the exposed silicon surface of a process wafer. Information from this interference signal allows the etch process to be characterized. Three methods are investigated: laser-on-SiO₂, laser-on-photoresist, and laser-on-both SiO₂ and silicon at a mask edge.

The measured data from these experiments are found to be in good agreement with theoretical calculations. Differences in reflected beam amplitude and interference fringe frequency represent well the differences SiO₂ and …