Engineering Commons^™

Low Pressure Chemical Vapor Deposition Of Silicon Nitride Films From Ditertiarybutylsilane, Xiangqun Fan

Theses

In this study amorphous stoichiometric silicon nitride films were synthesized by low pressure chemical vapor deposition (LPCVD) using DTBS (ditertiarybutylsilane) and ammonia (NH₃). The growth kinetics were determined as a function of temperature in the range of 600-900 00, pressure in the range of 0.2-1.1 Torr, DTBS flow rate in the range of 10-50 sccm, and NH₃/DTBS flow ratio in the range of 5-20. At constant condition of pressure (0.5 Torr), DTBS flow rate (10sccm) and NH₃ flow rate (100 sccm), the deposition rate of as-deposited silicon nitride films was found to follow an Arrehnius …

Processing, Structural And Electrical Properties Of Sic, Mark Farhad-Garousi

Theses

Cubic silicon carbide films grown by chemical vapor deposition (CVD) on silicon substrates typically have n-type conductivity at 300 °K dominated by a heavily compensated donor with a binding energy in the < 20 meV range. Binding energies <20 meV are not expected in SiC for isolated donors because the shallowest expected binding energy for an electron bound to an isolated donor is approximately 47 meV. The work done on this topic by a few group of scientists has been studied.

Laser Treatment Of Ceramic Coatings On Defective Ceramic Glazed Tile, Gousinn Yu

Theses

Laser surface melting treatment was achieved by a 2 Kw CO2 surgical laser system.The partially defocused laser beam provided a circular spot with an annular energy distribution on the sample.

It is certain that laser surface treatment will do the job of repairing in defective ceramic tiles. All glazes provided by American Standard were tested for an ability of withstand laser treatment when coated on to a glazed tile. In order to repair the defective ceramic tile it is necessary to patch the damaged region with a cement. The cement must then be glazed in order to match that of …