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Materials Science and Engineering
Missouri University of Science and Technology
Capacitors<br />Dielectrics<br />Electrodes<br />Nanotechnology<br />Sputtering (Physics)<br />Thin films
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Thin Film Techniques For The Fabrication Of Nano-Scale High Energy Density Capacitors, James N. Reck
Thin Film Techniques For The Fabrication Of Nano-Scale High Energy Density Capacitors, James N. Reck
Doctoral Dissertations
Dielectric thin films of either TiO₂ or BaTiO₃ were sputtered in O₂/Ar plasmas on Si wafers to thicknesses ranging from approximately 25 to 200 nm with patterned Ni or Pt electrodes sputtered in Ar plasmas at thicknesses from about 20 to 250 nm to form nano-capacitors. Statistical design of experiments (DOE) was used to determine the effects of the deposition power, plasma composition, and deposition temperature on the measured electrical properties of the nano-capacitors. Additional tests to determine the effects of the dielectric and electrode thickness on the measured dielectric responses of the devices were also undertaken. Characterization was performed …