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Synthesis And Characterization Of Silicon Dioxide Films Using Diethyl Silane And Oxygen, Kiran Kumar
Synthesis And Characterization Of Silicon Dioxide Films Using Diethyl Silane And Oxygen, Kiran Kumar
Theses
This study focuses on producing thin and thick silicon dioxide films towards the fabrication of integrated optical sensor capable of monitoring and determining in-situ, the concentration of numerous analyze species simultaneously. In this study, diethylsilane (DES) has been used as a precursor to produce silicon dioxide films by low pressure chemical vapor deposition. The films were synthesized with two different flow ratios of oxygen to DES in the temperature range of 550°C to 800°C at a constant pressure of 200mTorr. The films deposited with lower oxygen to DES flow ratio have very high growth rate but suffer from high tensile …