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Design Guide For Cmos Process On-Chip 3d Inductor Using Thru-Wafer Vias, Gary Vanackern

Boise State University Theses and Dissertations

Three-dimensional (3D) inductors using high aspect ratio (10:1) thru-wafer via (TWV) technology in a complementary metal oxide semiconductor (CMOS) process have been designed, fabricated, and measured. The inductors were designed using 500 μm tall vias with the number of turns ranging from 1 to 20 in both a wide and narrow trace width to space ratios. Radio frequency characterization was studied with emphasis upon de-embedding techniques and resulting effects. The open, short, thru de-embedding (OSTD) technique was used to measure all devices. The highest quality factor (Q) measured was 11.25 at 798MHz for a 1-turn device with a self-resonant frequency …