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Modeling Of Rapid Thermal Processing System By Finite Element Method, Helen Martynov
Modeling Of Rapid Thermal Processing System By Finite Element Method, Helen Martynov
Theses
A finite element model for the Rapid Thermal Processing (RTP) system at NJIT was developed based on the software package MSC/NASTRAN. Based on this model, a thermal analysis of the 9" chamber, 3 zones (37 lamps) RTP system was conducted for various modes of system operation with the 6" silicon wafer temperature varying from 300°K to 1100°K. An open-loop control algorithm was developed in order to study the dependence of wafer temperature on time, position, and applied radiant heat distribution. It was shown that the non-uniformity in the radial temperature profile can be less than 3°C during wafer heating at …