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Laser Plasma Radiation Studies For Droplet Sources In The Extreme Ultraviolet, Reuvani Kamtaprasad
Laser Plasma Radiation Studies For Droplet Sources In The Extreme Ultraviolet, Reuvani Kamtaprasad
Electronic Theses and Dissertations
The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and target configurations. This work demonstrates the generation of EUV radiation by creating laser plasmas from mass-limited targets with indium, tin, and antimony doped droplets. Spectral emission from the …
Modeling Of Liquid Crystal Display And Photonic Devices, Zhibing Ge
Modeling Of Liquid Crystal Display And Photonic Devices, Zhibing Ge
Electronic Theses and Dissertations
Liquid crystal (LC) materials have been widely applied in electro-optical devices, among which display is the most successful playground and numerous new applications in photonic areas (such as laser beam steering devices) are also emerging. To well guide the device design for optimum performance, accurate modeling is of prior and practical importance. Generally, the modeling of LC devices includes two parts in sequence: accurate LC molecule deformation extraction under external electric fields and optical calculation thereafter for the corresponding electro-optical behaviors. In this dissertation, first, hybrid finite element method and finite difference method are developed to minimize the free energy …