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Full-Text Articles in Engineering
Ultrafast Laser Material Processing For Photonic Applications, Mark Ramme
Ultrafast Laser Material Processing For Photonic Applications, Mark Ramme
Electronic Theses and Dissertations
Femtosecond Laser Direct Writing (FLDW) is a viable technique for producing photonic devices in bulk materials. This novel manufacturing technique is versatile due to its full 3D fabrication capability. Typically, the only requirement for this process is that the base material must be transparent to the laser wavelength. The modification process itself is based on non-linear energy absorption of laser light within the focal volume of the incident beam. This thesis addresses the feasibility of this technique for introducing photonic structures into novel dielectric materials. Additionally, this work provides a deeper understanding of the lightmatter interaction mechanism occurring at high …
A Laser Radar Employing Linearly Chirped Pulses From A Mode-Locked Laser For Long Range, Unambiguous, Sub-Millimeter Resolution Ranging And Velocimetry, Mohammad Umar Piracha
A Laser Radar Employing Linearly Chirped Pulses From A Mode-Locked Laser For Long Range, Unambiguous, Sub-Millimeter Resolution Ranging And Velocimetry, Mohammad Umar Piracha
Electronic Theses and Dissertations
Light detection and ranging (lidar) is used for various applications such as remote sensing, altimetry and imaging. In this talk, a linearly chirped pulse source is introduced that generates wavelength-swept pulses exhibiting ~6 nm optical bandwidth with > 20 km coherence length. The chirped pulses are used in an interferometric lidar setup to perform distance measurements with sub-millimeter resolution (using pulses that are a few meters long), at target distances > 10 km, with at least 25 dB signal-to-noise ratio at the receiver. A pulse repetition rate of 20 MHz provides fast update rates, while chirped pulse amplification allows easy amplification of …
Laser Plasma Radiation Studies For Droplet Sources In The Extreme Ultraviolet, Reuvani Kamtaprasad
Laser Plasma Radiation Studies For Droplet Sources In The Extreme Ultraviolet, Reuvani Kamtaprasad
Electronic Theses and Dissertations
The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and target configurations. This work demonstrates the generation of EUV radiation by creating laser plasmas from mass-limited targets with indium, tin, and antimony doped droplets. Spectral emission from the …
High-Intensity Ultra-Fast Laser Interaction Technologies, Robert Thomas Bernath
High-Intensity Ultra-Fast Laser Interaction Technologies, Robert Thomas Bernath
Electronic Theses and Dissertations
To our knowledge this is the first comprehensive study of laser-induced effects generated at intermediate distances using self-channeled femtosecond laser pulses. Studies performed were made both experimentally and theoretically with the use of novel modeling techniques. Peak laser pulse powers above 3 GW allow beam propagation without divergence for up to several kilometers. In this regime, experiments were performed at 30 meters from the laser system in a custom propagation and target range, utilizing the Laser Plasma Laboratory's Terawatt laser system. Experiments included investigations of laser ablation; electromagnetic pulsed (EMP) radiation generation over the 1-18 GHz region; shockwave formation in …
Debris Characterization And Mitigation Of Droplet Laser Plasma Sources For Euv Lithography, Kazutoshi Takenoshita
Debris Characterization And Mitigation Of Droplet Laser Plasma Sources For Euv Lithography, Kazutoshi Takenoshita
Electronic Theses and Dissertations
Extreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The wavelength of choice is 13.5 nm determined by the optimum reflectivity of the mirror coatings. The light source required for this wavelength is derived from a hot-dense plasma produced by either a gas discharge or a laser. This study concentrate only on the laser produced plasma source because of its advantages of scalability to higher repetition rates. …